Three-dimensional nanofabrication using HSQ/PMMA bilayer resists
نویسندگان
چکیده
Citation Do, Hyung Wan, Jae-Byum Chang, and Karl K. Berggren. “Three-Dimensional Nanofabrication Using Hydrogen Silsesquioxane/poly(methylmethacrylate) Bilayer Resists.” Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 32, no. 6 (November 2014): 06F501. As Published http://dx.doi.org/10.1116/1.4893659 Publisher American Vacuum Society (AVS)
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Electron beam lithography of HSQ/PMMA bilayer resists for negative tone lift-off process
A HSQ/PMMA bilayer resist system, in which HSQ as negative tone electron beam resist top layer and PMMA as bottom layer, has been investigated for negative tone lift-off process. Patterns are first defined on the HSQ resist using electron beam lithography, and then transferred into the bottom PMMA layer using oxygen reactive ion etching. Electron beam exposure of HSQ on top of PMMA layer has be...
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